Gas cluster ion beam low mass ion filter
AssigneeEpion Corporation
InventorsRichard P. Torti, Jerald P. Dykstra
Life of this patent
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Abstract
Incorporating the use of a permanent magnet within a GCIB apparatus to separate undesirable monomer ions from a gas cluster ion beam to facilitate improved processing of workpieces. In an alternate embodiment, the effect of the permanent magnet may be controlled by the use of an electrical coil. The above system eliminates problems related to power consumption and heat generation.
Claims16
Gas cluster ion beam apparatus for processing a workpiece, said apparatus comprising:
- a vacuum vessel in which the workpiece is to be located;
- means for holding the workpiece in said vacuum vessel for processing;
- means for generating a gas cluster ion beam within said vacuum vessel;
- means for accelerating said gas cluster ion beam onto the workpiece;
- and
- means for separating undesired ions from said gas cluster ion beam so that said undesired ions do not impact the workpiece.
A method for separating undesired ions from a gas cluster ion beam used for processing a workpiece, said method comprising the steps of:
- disposing the workpiece in a vacuum vessel for processing;
- generating a gas cluster ion beam within said vacuum vessel;
- directing said gas cluster ion beam in a first direction to irradiate the workpiece;
- redirecting said undesired ions in a second direction;
- and
- preventing said undesired ions from irradiating the workpiece.
A method for switchably separating undesired ions from a gas cluster ion beam used for processing a workpiece, said method comprising the steps of:
- disposing the workpiece in a vacuum vessel for processing;
- generating a gas cluster ion beam within said vacuum vessel;
- directing said gas cluster ion beam in a first direction to irradiate the workpiece;
- utilizing a hybrid permanent/electro-magnet having a gap with a B-field so that said gas cluster ion beam passes through said gap in a direction substantially perpendicular to said B-field;
- controllably deflecting said undesired ions an amount sufficient to permit their separation from the gas cluster ion beam, while leaving the gas cluster ion beam substantially undeflected;
- and
- preventing said undesired ions from irradiating the workpiece.
Dependencies are inferred from the claim text.