Optical material and optical element using the same
AssigneeMitsubishi Materials Corporation
InventorsKenji Yamaguchi, Kazuki Mizushima
Life of this patent
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Abstract
An optical material including a crystalline silicon and FexSi2 in the form of dots, islands, or a film is provided. The FexSi2 has a symmetrical monoclinic crystalline structure belonging to the P21/c space group and is synthesized at the surface or in the interior of the crystalline silicon. The monoclinic structure corresponds to a deformed structure of β-FeSi2 generated by heteroepitaxial stress between the {110} plane of the FexSi2 and the {111} plane of the crystalline silicon. The value of x is 0.85≦x≦1.1. An optical element using the optical material is also provided.
Claims10
An optical material comprising:
- a crystalline silicon;
- and
- FexSi2 in the form of dots, islands, or a film,
- wherein the FexSi2 has a symmetrical monoclinic crystalline structure belonging to the P21/c space group and is synthesized at the surface or in the interior of the crystalline silicon,
- wherein the monoclinic structure corresponds to a deformed structure of β-FeSi2 generated by heteroepitaxial stress between the {110} plane of the FexSi2 and the {111} plane of the crystalline silicon, and
- wherein x is 0.85≦x≦1.1.
An optical material comprising:
- a crystalline silicon;
- and
- FexSi2 in the form of dots, islands, or a film,
- wherein the FexSi2 has a symmetrical monoclinic crystalline structure belonging to the C2/c space group and is synthesized at the surface or in the interior of the crystalline silicon,
- wherein the monoclinic structure corresponds to a deformed structure of β-FeSi2 generated by heteroepitaxial stress between the {101} plane of the FexSi2 and the {111} plane of a crystalline silicon, and
- wherein x is 0.85≦x≦1.1.
Dependencies are inferred from the claim text.