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US 2001/0032829 A1Published application
Novel composition for selective etching of oxides over metals
AssigneeArch Specialty Chemicals, Inc.
InventorsKenji Honda, Michelle Elderkin
Life of this patent
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Abstract
A composition for selective etching of oxides over a metal. The composition contains water, hydroxylammonium salt, carboxylic acid, a fluorine containing compound, and optionally, a base. The pH of the composition is about 2 to 6.
Claims20
A composition for selective etching of oxides over a metal comprising:
- (a) water;
- (b) hydroxylammonium salt;
- (c) carboxylic acid;
- (d) a fluorine containing compound;
- and
- (e) optionally, base.
3 more elements
A composition for selective etching of oxides over a metal substrate comprising:
- (a) water;
- (b) about 0.1 wt. % to 0.5 wt. % hydroxylammonium sulfate;
- (c) about 0.1 wt. % to 1.0 wt. % citric acid;
- and
- (d) about 0.01 wt. % to 0.5 wt. % hydrogen fluoride.
2 more elements
A method for removing the residue on a metal substrate having low-k interlayers, comprising the step of;
- applying a composition comprising (a) water, (b) hydroxylammonium salt, (c) carboxylic acid, and (d) a fluorine containing compound to the metal substrate.
Dependencies are inferred from the claim text.