Electrode plate for plasma etching equipment for forming uniformly-etched surface

Abstract

An electrode plate which can provide a uniformly-etched surface to an etching surface of a plate to be etched is disclosed, which is used for a plasma etching equipment having such a structure that an electrode plate having a plurality of small vertical through holes is arranged opposite to an etching surface at a prescribed distance from the etching surface, and an etching gas which is introduced into the plasma etching equipment is jetted from the small vertical through holes of the electrode plate and plasma is generated between the etching surface and the surface of the electrode plate to carry out etching, and is characterized in that the electrode plate is composed of high-pure silicon having a cast structure which is formed by a unidirectional solidification perpendicular to the etching surface, thereby to make it possible to form a uniformly-etched surface.

Dependencies are inferred from the claim text.