Photomask blank, photomask and method of manufacture
AssigneeShin-Etsu Chemical Co., Ltd.
InventorsHideo Kaneko, Yukio Inazuki, Tamotsu Maruyama, Satoshi Okazaki
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Abstract
A photomask blank has at least one layer of chromium base film on a transparent substrate. The chromium base film of chromium oxycarbide (CrCO) or chromium oxynitride carbide (CrCON) is formed by a reactive sputtering technique using chromium or chromium containing O, N or C as the target and a mixture of carbon dioxide gas and an inert gas as the sputtering gas. A photomask is manufactured by lithographically patterning the photomask blank. The photomask blank and photomask are of quality featuring high uniformity within the substrate plane and ease of control during manufacture.
Claims6
A photomask blank comprising a transparent substrate and at least one layer of chromium base film thereon, wherein said chromium base film has been formed by reactive sputtering using chromium or chromium containing at least one element of oxygen, nitrogen and carbon as the target and a sputtering gas containing at least carbon dioxide gas and an inert gas.
A method of manufacturing a photomask blank having at least one layer of chromium base film on a transparent substrate, comprising the step of effecting reactive sputtering using chromium or chromium containing at least one element of oxygen, nitrogen and carbon as the target and a sputtering gas containing at least carbon dioxide gas and an inert gas, for forming the chromium base film.
Dependencies are inferred from the claim text.