Coating apparatus and method for producing a heat-insulating layer on a substrate
AssigneeSiemens Aktiengesellschaft
InventorsWolfram Beele, Thomas Jung, Peter-Jochen Brand
Life of this patent
Estimating the term…
Abstract
The invention relates to a component having a substrate and a ceramic heat-insulating layer which is arranged thereon. This heat-insulating layer has a columnar structure having ceramic stems which are essentially oriented mainly normal to the surface of the substrate and have a respective stem diameter of less than 2.5 μm. The invention also relates to a coating apparatus for producing a heat-insulating layer on a substrate and to a method of coating a substrate in the manner of a reactive gas-flow sputtering method.
Claims16
Coating apparatus for producing a heat-insulating layer on a substrate, comprising
- a) a holding device for positioning the substrate,
- b) a hollow-cathode arrangement through which an inert gas can flow and which comprises a cathode material and an anode and has a gas-outlet opening facing the holding device, and a gas-inlet opening for inert gas, and
- c) a separate heating device for directly heating the substrate with heat radiation and/or convection.
Method of coating a substrate under vacuum with a heat-insulating layer, in which method an inert gas is ionized in an essentially oxygen-free atmosphere, and the ionized inert gas releases from a metallic cathode material metal atoms, which are carried along with the inert gas in the direction of the substrate and to which oxygen is fed before the substrate is reached so that a metal oxide forms and is deposited on the substrate or metal is deposited on the substrate and is oxidized by oxygen coming into contact with it, the substrate being heated to a predetermined germinating temperature of over 800° C.
Dependencies are inferred from the claim text.