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AssigneeCarl-Zeiss-Stiftung
InventorsKarl-Heinz Schuster, Hubert Holderer, Rudolf Von Bunau, Christian Wagner, Jochen Becker, Stefan Xalter, Wolfgang Hummel
Estimating the term…
An optical arrangement, in particular a microlithographic projection printing installation, has in particular a slot-shaped image field or rotationally non-symmetrical illumination. An optical element (1) is therefore acted upon in a rotationally non-symmetrical manner by the radiation of the light source. A compensating light supply device (11, 14 to 19) is optically coupled via the peripheral surface (13) of the optical element (1) to the latter. It supplies compensating light (16, 12) to the optical element (1) in such a way that the temperature distribution in the optical element (1), which arises as a result of cumulative heating of the optical element (1) with projection light (2) and compensating light (12), is at least partially homogenized. In said manner image defects induced by the projection light are corrected.
An optical arrangement, in particular a microlithographic projection printing installation, in particular having a slot-shaped image field or rotationally non-symmetrical illumination,
An optical arrangement as claimed in one of the preceding claims, wherein the compensating light supply device (11, 14 to 19;
An optical arrangement as claimed in one of the preceding claims, wherein the peripheral surface (113, 213) of the optical element (101;
An optical arrangement as claimed in one of the preceding claims, wherein the peripheral surface (13;
An optical arrangement as claimed in one of the preceding claims, wherein the emission wavelength of the light source (17) is greater than 4 μm.
An optical arrangement as claimed in one of the preceding claims, wherein the optical element (1;
Dependencies are inferred from the claim text.