Exposure apparatus, microdevice, photomask, and exposure method
AssigneeNikon Corporation
InventorsNobuyuki Irie, Katsuaki Ishimaru
Life of this patent
Estimating the term…
Abstract
An exposure apparatus for exposing for example a substrate for production of a working reticle through a master reticle on which a pattern is formed, provided with three support members for supporting the substrate substantially horizontally at three locations outside illuminated areas of the substrate (pattern area, alignment mark areas, and information mark areas).
Claims28
An exposure apparatus for exposing a substrate through a mask on which a pattern is formed, comprising three first support members which support said substrate substantially horizontally at three locations outside of illuminated areas of said substrate.
An exposure apparatus for exposing a substrate through a mask on which a pattern is formed, comprising a moving body provided with a plurality of supports having surface roughness of the surfaces abutting against the substrate set to at least 0.1 μmRa or so.
An exposure apparatus for exposing a substrate through a mask on which a pattern is formed, comprising a substrate holder on which the substrate is placed, and a moving body which supports a substrate holder substantially horizontally at three locations.
An exposure method for exposing a substrate through a mask on which a pattern is formed, comprising a step of exposing the substrate in a state held substantially horizontally at three locations outside of illuminated areas of said substrate.
Dependencies are inferred from the claim text.