Exposure apparatus

A method for conducting an exchange of gases in a sealed chamber provided in an exposure apparatus, comprising a gas exchanging step including:

• a first sub-step of exhausting a gas in said sealed chamber from a gas exhaust side thereof, while said sealed chamber is closed on a gas supply side thereof;
• and
• a second sub-step of supplying an inert gas to said sealed chamber from the gas supply side thereof, while said sealed chamber is closed on the gas exhaust side thereof,
• wherein each of said first sub-step and said second sub-step is conducted in a substantially stationary state with respect to a pressure of the gas in said sealed chamber.

An exposure apparatus comprising:

• an illumination optical system adapted to emit exposure light, said exposure light being adapted to illuminate a mask pattern to thereby transfer said mask pattern to a substrate;
• a sealed chamber provided in said illumination optical system;
• and
• a gas exchanging device adapted to exhaust a gas in said sealed chamber and supply an inert gas to said sealed chamber.

A projection exposure apparatus for transferring a pattern on a mask to a photosensitive substrate, comprising:

• a light source adapted to emit exposure light having a wavelength range in which a photosensitive substrate is sensitive to said exposure light;
• an illumination optical system provided between said light source and said mask;
• a projection optical system provided between said mask and said photosensitive substrate;
• a sealed chamber containing a gas and provided in an optical path of said exposure light between said light source and said photosensitive substrate;
• and
• a gas circulating device connected to said sealed chamber,
• said gas circulating device being adapted to exhaust the gas contained in said sealed chamber to an outside thereof, to thereby compensate for variations in intensity of said exposure light on said photosensitive substrate.

A projection exposure apparatus for transferring a pattern on a mask to a photosensitive substrate, comprising:

• a light source adapted to emit exposure light having a wavelength range in which a photosensitive substrate is sensitive to said exposure light;
• a sealed chamber provided in an optical path of said exposure light between said light source and said photosensitive substrate;
• and
• a gas circulating device having a sensor and connected to said sealed chamber,
• said sensor being adapted to detect and output information corresponding to a pressure in said sealed chamber, and
• said gas circulating device being adapted to supply an inert gas to said sealed chamber in accordance with the information outputted from said sensor.

A method for transferring a pattern on a mask to a photosensitive substrate, comprising the steps of:

• illuminating said mask with exposure light, to thereby transfer said pattern on the mask to a photosensitive substrate;
• and
• exchanging an inert gas contained in a sealed chamber with another gas,
• said sealed chamber being provided in an optical path of said exposure light,
• to thereby compensate for variations in light transmittance and light reflectance of an optical member provided in said optical path of the exposure light.

An exposure apparatus for transferring a pattern on a mask to a photosensitive substrate, comprising:

• an optical system adapted to allow exposure light to enter,
• said exposure light being adapted to be irradiated to a photosensitive substrate;
• and
• a device adapted to supply a gas capable of suppressing attenuation of said exposure light to said optical system, according to a change in light transmittance of said optical system which occurs due to entrance of said exposure light.

A method for making an apparatus for transferring a pattern on a mask to a photosensitive substrate, comprising the steps of:

• providing an optical system between a light source and a photosensitive substrate,
• said light source being adapted to emit exposure light,
• said exposure light being adapted to enter said optical system and irradiate said photosensitive substrate;
• and
• providing a device adapted to supply a gas capable of suppressing attenuation of said exposure light to said optical system, according to a change in light transmittance of said optical system.