Plasma processing apparatus
AssigneeTokyo Electron Limited
InventorNobuo Ishii
Life of this patent
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Abstract
A plasma processing apparatus includes a processing container 53, a mounting table 61 for supporting a semiconductor wafer W arranged in the processing container 53, an endless-and-annular antenna 73 attached to a sealing plate 55 opposing the wafer W to introduce a microwave into the container 53 through the plate 55, a propagation waveguide 81 connected to the annular antenna 73 to supply the microwave to the antenna 73, and a microwave supplier 83 connected to the propagation waveguide 81 to supply the microwave to the waveguide 81. In arrangement, the annular antenna 73 is arranged so that its part along the sealing plate 55 accords with an antinode of a standing wave of the microwave, producing an uniform plasma in the processing container 53.
Claims14
A plasma processing apparatus comprising:
- a processing container in form of a cylinder with a bottom;
- a supporting unit disposed in the processing container to support an object to be processed;
- a dielectric window arranged so as to oppose the object supported by the supporting unit to close up an opening of the processing container;
- an annular waveguide shaped to be an endless ring and also fitted to the dielectric window to introduce a microwave into the processing container through the dielectric window, the annular waveguide having a dielectric window part arranged along the dielectric window;
- a propagation waveguide connected to the annular waveguide to supply the microwave to the annular waveguide;
- and
- a microwave supplier connected to the propagation waveguide to supply the microwave to the propagation waveguide,
- wherein the annular waveguide is arranged so that an antinode of a standing wave of the microwave in the waveguide is located at the dielectric window part.
A plasma processing apparatus comprising:
- a processing container in form of a cylinder with a bottom;
- a supporting unit disposed in the processing container to support an object to be processed;
- a dielectric window arranged so as to oppose the object supported by the supporting unit to close up an opening of the processing container;
- an annular waveguide shaped to be an endless ring and also fitted to the dielectric window to introduce a microwave into the processing container through the dielectric window, the annular waveguide having its part arranged along the dielectric window;
- a propagation waveguide connected to the annular waveguide to supply the microwave to the annular waveguide;
- and
- a microwave supplier connected to the propagation waveguide to supply the microwave to the propagation waveguide,
- wherein a traveling wave is generated in the annular waveguide by the microwave supplied from the propagation waveguide.
A plasma processing apparatus comprising:
- a processing container in form of a cylinder with a bottom;
- a supporting unit disposed in the processing container to support an object to be processed;
- a dielectric window arranged so as to oppose the object supported by the supporting unit to close up an opening of the processing container;
- an annular waveguide shaped to be an endless ring and also fitted to the dielectric window to introduce a microwave into the processing container through the dielectric window, the annular waveguide having its part arranged along the dielectric window;
- a propagation waveguide connected to the annular waveguide to supply the microwave to the annular waveguide;
- a microwave supplier connected to the propagation waveguide to supply the microwave to the propagation waveguide;
- and
- a traveling-wave supplier for supplying the microwave which has been propagated through the propagation waveguide, into the annular waveguide as traveling wave.
Dependencies are inferred from the claim text.