Recessed coil for generating a plasma
OwnerAnantha Subramani, John C. Forster +5inventors
InventorsAnantha Subramani, John C. Forster, Bradley O. Stimson, Sergio Edelstein, Howard Grunes, Avi Tepman, Zheng Xu
Life of this patent
Estimating the term…
Abstract
A recessed coil for a plasma chamber in a semiconductor fabrication system is provided. Recessing the coil reduces deposition of material onto the coil which in turn leads to a reduction in particulate matter shed by the coil onto the workpiece.
Claims82
An apparatus for energizing a plasma within a semiconductor fabrication system by coupling energy into the plasma, the apparatus comprising:
- a semiconductor fabrication chamber having a first wall, a second wall spaced inwardly of said chamber from said first wall and a plasma containment region at least partially defined by said first and second walls;
- and
- a coil supported on the second wall in a position at least partially exposed to said plasma containment region and positioned to couple energy into the plasma containment region.
An apparatus for energizing a plasma within a semiconductor fabrication chamber by coupling energy into the plasma, the apparatus comprising:
- a generally annular-shaped shield wall;
- a generally disk-shaped target positioned above the shield wall;
- and
- an adapter ring positioned between the shield wall and the target and having a recess therein exposed inwardly of the chamber, said adapter ring having a coil positioned at least partially in said recess and energizable by an a.c. source to couple energy into the plasma containment region.
An apparatus for energizing a plasma within a semiconductor fabrication system by coupling energy into the plasma, the apparatus comprising:
- a semiconductor fabrication chamber having a shield wall and a plasma containment region within the wall;
- a coil carried by the wall and positioned to couple energy into the plasma containment region;
- a target positioned above the plasma containment region;
- and
- a second shield wall positioned between the target and the shield to shield the coil from at least a portion of the target.
A standoff for supporting a coil in a semiconductor fabrication system having a wall upon which deposition material is deposited, comprising:
- a first base member adapted to be coupled to the wall;
- and
- a first cover member adapted to be coupled to the coil, said cover member being positioned over the base member, said cover member and base member defining a passage between the base member and the cover member, wherein at least one of the cover member and the base member is made of an insulative material.
A standoff for coupling RF current though an opening in a wall to a coil in a semiconductor fabrication system, comprising:
- a first conductive member adapted to extend through said wall opening, said first conductive member having first and second ends, said first end being positioned on a first side of said wall and being adapted to be coupled to a source of RF current, and said second end being positioned on a second side of said wall opposite said first side of said wall and being adapted to be electrically coupled to said coil;
- a first insulative base member adapted to extend through said wall opening between said conductive member and said wall to insulate said conductive member from said wall;
- and
- a first cover member positioned to at least partially cover said base member, said first cover member and base member defining a passage between said first base member and said first cover member.
A method of supporting a coil in a semiconductor fabrication system having a wall upon which deposition material is deposited, comprising:
- positioning a base member on the wall;
- and
- positioning a first cover member over the base member and supporting the coil, said cover member and base member defining a plurality of passages between the base member and the first cover member, wherein at least one of the first cover member and the base member is made of an insulative material.
Dependencies are inferred from the claim text.