Chemical planar head dampening system
AssigneeInternational Business Machines Corporation
InventorsJames R. Case, Gerald A. Kiballa, Michael A. Shuman
Life of this patent
Estimating the term…
Abstract
An improved polishing apparatus having a dampening system to prevent fluctuations between the planar head polishing device and the circuit panel. The dampening system includes a load actuation arm having a hydraulic-pneumatic cylinder which is controlled by an connected dampening circuit.
Claims25
A polishing apparatus having at least one polishing device and a support platform comprising:
- a load actuating arm, mounted at a first end to the support platform and at a second end to the polishing device;
- and
- a dampening circuit connected to the load actuating arm to prevent fluctuations.
A polishing apparatus comprising:
- a conveyor mounted to a platform to transport a workpiece to a polishing area of the apparatus;
- and
- a plate pivotally secured above the conveyor carrying an at least one polishing device rotatably mounted therein.
A polishing apparatus having at least one polishing device and a support platform comprising:
- a conveyor mounted to the platform to transport a circuit panel to the at least one planar head assembly;
- a plate pivotally secured above the conveyor;
- a planar head rotatably mounted within the plate;
- a load actuating arm, mounted at a first end to the support platform and at a second end to the plate;
- and
- a dampening circuit connected to the load actuating arm to prevent fluctuations.
A polishing apparatus having a dampening system to prevent fluctuations.
Dependencies are inferred from the claim text.