Method of fabricating an array substrate
AssigneeLG.Philips LCD Co., Ltd.
InventorDong-Hee Kim
Life of this patent
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Abstract
An array substrate for use in an X-ray sensing device and in an LCD device is fabricated using plasma gas treatment. Especially, an indium-tin-oxide (ITO) transparent conductive metallic layer is plasma-treated by N2 plasma, He plasma or Ar plasma, before forming the insulation layer on the ITO transparent conductive metallic layer. Thus, the plasma removes the impurities on a surface of the transparent conductive metallic layer and changes the lattice structure of the surface of the transparent conductive metallic layer, and thus the adhesion between the transparent conductive metallic layer and the insulation layer is improved. The defects caused by a gap or a space between the transparent conductive metallic layer and the insulation layer do not occur.
Claims15
A method of fabricating an array substrate, the array substrate having a switching element with gate, source and drain electrodes, and a transparent conductive metallic layer, the method comprising:
- treating a surface of the transparent conductive metallic layer with plasma gas;
- and
- forming an insulation layer on the transparent conductive metallic layer and the switching element.
A method of fabricating an array substrate, comprising:
- forming the switching device on the substrate;
- forming a transparent conductive material on the substrate;
- exposing a surface of the transparent conductive material with plasma gas;
- depositing an insulating material on the transparent conductive material after exposing the surface of the transparent conductive material with the plasma gas.
Dependencies are inferred from the claim text.