Light-sensitive composition and method for forming relief image using said composition
AssigneeMitsubishi Paper Mills Limited
InventorAkira Furukawa
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Abstract
There are disclosed a light-sensitive composition which comprises (A) a polymer having a phenyl group substituted by a vinyl group at a side chain, (B) a photopolymerization initiator and (C) a sensitizer which sensitizes the photo-polymerization initiator, or a light-sensitive composition which comprises (A′) a polymer, the above-mentioned (B) and (C), and (D) a monomer having at least two phenyl groups each of which is substituted by a vinyl group in the molecule of the monomer; and a method of forming a relief image which comprises coating the light-sensitive composition as mentioned above on a support, exposing the composition by exposure or scanning exposure and developing the same to form a relief image on the support.
Claims32
A light-sensitive composition comprising (A) a polymer having a phenyl group substituted by a vinyl group at a side chain of the polymer, (B) a photopolymerization initiator and (C) a sensitizer which sensitizes the photopolymerization initiator.
A light-sensitive composition comprising (A′) a polymer, (D) a monomer having at least two phenyl groups each of which is substituted by a vinyl group in the molecule of the monomer, (B) a photopolymerization initiator and (C) a sensitizer which sensitizes the photopolymerization initiator.
Dependencies are inferred from the claim text.