Thin film forming device, thin film forming method, and self-light emitting device
AssigneeSemiconductor Energy Laboratory Co., Ltd.
InventorsMasaaki Hiroki, Shunpei Yamazaki
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Abstract
There is provided a means for selectively coating a coating liquid on a desired coating position when the coating liquid for forming an EL layer is coated. When the coating liquid is coated, a mask is provided between a coating liquid chamber and a substrate, and a voltage is applied to the mask, so that the coating liquid can be selectively coated on the desired coating position.
Claims21
A thin film forming method using a device comprising a coating liquid chamber containing coating liquid, a substrate provided with an electrode, and a mask between the coating liquid chamber and the substrate, the method comprising the steps of:
- forming atomized coating liquid in the coating liquid chamber;
- discharging the atomized coating liquid from the coating liquid chamber toward the substrate;
- making the coating liquid pass through an opening portion of the mask corresponding to the electrode;
- making the coating liquid reach the electrode on the substrate;
- and
- forming a thin film on the electrode.
A thin film forming device, comprising:
- a coating liquid chamber containing coating liquid;
- means for atomizing and discharging the coating liquid;
- a substrate provided with an electrode;
- a mask between the coating liquid chamber and the substrate;
- and
- means for applying a voltage to the mask.
1. A thin film forming method using a device comprising a coating liquid chamber containing coating liquid, a substrate provided with an electrode, and a mask between the coating liquid chamber and the substrate, the method comprising the steps of:
- forming atomized coating liquid in the coating liquid chamber;
- discharging the atomized coating liquid from the coating liquid chamber toward the substrate;
- making the coating liquid pass through an opening portion of the mask corresponding to the electrode;
- making the coating liquid reach the electrode on the substrate;
- and
- forming a thin film on the electrode,
- wherein a voltage is applied to the mask.
A thin film forming method using a device comprising a coating liquid chamber containing coating liquid, a substrate provided with an electrode, and a mask between the coating liquid chamber and the substrate, the method comprising the steps of:
- forming atomized coating liquid in the coating liquid chamber;
- discharging the atomized coating liquid from the coating liquid chamber toward the substrate;
- making the coating liquid pass through an opening portion of the mask corresponding to the electrode;
- making the coating liquid reach the electrode on the substrate;
- and
- forming a thin film on the electrode,
- wherein the atomized coating liquid is charged when the atomized coating liquid is discharged from the coating liquid chamber to the substrate.
A thin film forming device, comprising:
- a coating liquid chamber containing coating liquid;
- means for atomizing and discharging the coating liquid;
- a substrate provided with an electrode;
- a mask between the coating liquid chamber and the substrate;
- means for applying a voltage to the mask;
- and
- means for generating an electric field to guide the atomized coating liquid toward the substrate between the coating liquid chamber and the mask.
A thin film forming device, comprising:
- a coating liquid chamber containing coating liquid;
- means for atomizing and discharging the coating liquid;
- a substrate provided with an electrode;
- a mask between the coating liquid chamber and the substrate;
- means for applying a voltage to the mask;
- and
- means for charging the atomized coating liquid.
Dependencies are inferred from the claim text.