US 2001/0017148 A1 · Wet processing device

Abstract

A wet processing device of this invention is comprised of a chemical processing tank to store chemicals for processing the surface of the wafer, a wafer conveyor device to carry the wafer in and out of the interior of the chemical processing tank, and a sensor to determine the amount of air bubbles occurring within the chemical when present within the chemical processing tank and issue a first and a second control signal, and a wash tank to store water for washing the wafer carried out from the chemical processing tank by the wafer conveyor. The rising speed of the wafer conveyor device pulled the wafer up from the chemical processing tank is controlled in response to the first control signal, and the wash tank water fill quantity for supplying water to the wash tank is controlled in response to the second control signal.

Claims7

Dependent claims

A wet processing device comprising:

a chemical processing tank to store chemicals for processing the surface of the wafer, a wafer conveyor to carry said wafer in and out of the interior of said chemical processing tank, a sensor to determine the amount of air bubbles occurring within the chemical when present within said chemical processing tank and issue a first and a second control signal, and a wash tank to store water for washing said wafer carried out from said chemical processing tank by said wafer conveyor, wherein the pull-up speed of said wafer conveyor device pulling said wafer up from said chemical processing tank is controlled according to said first control signal, and said amount of water supplied to said wash tank is controlled according to said second control signal.

Dependencies are inferred from the claim text.

Wet processing device

Life of this patent

Wet processing device

Life of this patent

Abstract

Claims7