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US 2001/0017007 A1Published application
Polishing composition
AssigneeKao Corporation
InventorsToshiya Hagihara, Koichi Naito, Shigeo Fujii
Life of this patent
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Abstract
A polishing composition comprising silica particles, water, and Fe salt and/or Al salt of a polyaminocarboxylic acid; a polishing process comprising applying the polishing composition; a process for manufacturing a magnetic disk substrate, comprising the step of polishing a substrate with the polishing composition; a magnetic disk substrate manufactured by applying the polishing composition.
Claims10
A polishing composition comprising silica particles, water, and Fe salt and/or Al salt of a polyaminocarboxylic acid.
Dependencies are inferred from the claim text.