Processing apparatus and processing method

A processing apparatus configured to process a substrate, the processing apparatus comprising:

• a substrate holder having a substrate holding surface configured to attract and hold the substrate thereon, and including a porous member serving as a substrate attracting member and a chuck base configured to support the porous member from below;
• a liquid supply line connected to the substrate holder and configured to supply water to the porous member;
• an entire surface cleaner configured to clean an entire surface of the substrate holder by supplying water from the porous member of the substrate holder;
• an edge cleaner configured to clean an edge portion of the substrate holding surface;
• and
• a controller including a computer and a program storage storing a program,
• wherein the program storage and the program are configured, with the computer, to cause the processing apparatus to:
• carry out the substrate that has been ground by a grinder from the substrate holder and then control the entire surface cleaner and the edge cleaner to simultaneously clean both the entire surface of the substrate holder and the edge portion of the substrate holding surface.