Substrate processing apparatus and substrate processing method

A substrate processing apparatus, comprising:

• an inspection substrate including a base and an imaging unit disposed at the base;
• a holder configured to hold a substrate or the inspection substrate;
• a driving unit configured to rotate the holder;
• a processing liquid supply configured to supply a processing liquid to the substrate held by the holder,
• a cup member configured to surround the holder from an outside thereof;
• and
• a controller,
• wherein the imaging unit is disposed at a position for imaging the cup member,
• wherein the controller is configured to perform:
• adjusting the position of the imaging unit to a predetermined first imaging position corresponding to a specific circumferential position of the cup member, by controlling the driving unit to rotate the holder in a state that the inspection substrate is held by the holder;
• and
• imaging, after the adjusting of the position of the imaging unit to the first imaging position, an imaging target that is located in a space closer to the cup member than to an outer periphery of the base at the first imaging position by controlling the imaging unit.