Liquid chemical processing device

A liquid chemical processing device comprising:

• a processing tank in which resist removal processing is performed by immersing substrates in a chemical;
• a storage tank;
• a discharge tank;
• a plurality of holders configured to hold the substrates in a vertical posture;
• vertical drivers configured to individually and vertically drive the plurality of holders;
• and
• a chuck configured to disengageably chuck the substrates,
• wherein the vertical drivers are configured to individually and vertically move the plurality of holders between an immersed position where the substrates are immersed in the chemical and a non-immersed position where the substrates are lifted up from the chemical, and the substrates held by the plurality of holders are subjected to the resist removal processing in a single wafer manner,
• wherein a nozzle is disposed at an upper portion of the processing tank, the nozzle being configured to eject the chemical downward toward the substrates,
• the processing tank communicates with the storage tank that is adjacent to and downstream of the processing tank through a communication port provided in a bottom of a communication side-wall of the processing tank, the storage tank being adjacent to and in communication with the discharge tank, and bottoms of the processing tank, the storage tank and the discharge tank being inclined downward in a downstream direction of flow of the chemical toward the discharge tank, and
• the communication port and the storage tank are not provided with a driver to move the substrates.