Spatial light modulator device using a phase change material and methods for forming the same

A method of forming a spatial light modulator device, the method comprising:

• depositing a via-level dielectric layer over a semiconductor substrate;
• forming bottom electrode via structures through the via-level dielectric layer;
• depositing a metallic heater material layer over the bottom electrode via structures;
• forming openings in the metallic heater material layer;
• depositing a set of material layers comprising a spacer dielectric material layer, a phase change material layer, and a capping dielectric material layer over the metallic heater material layer;
• and
• patterning the set of material layers and the metallic heater material layer into an array of layer stacks by performing at least one anisotropic etch process, wherein each of the layer stacks comprises a metallic heater plate, a spacer dielectric material plate, a phase change material plate, and a capping dielectric material plate.

A method of forming a spatial light modulator device, the method comprising:

• forming field effect transistors over a semiconductor substrate;
• forming metal interconnect structures within dielectric material layers over the field effect transistors;
• forming an array of spatial light modulator cells over the dielectric material layers by patterning a metallic heater material layer, a spacer dielectric material layer, and a phase change material layer into layer stacks,
• wherein each layer stack comprises a metallic heater plate, a spacer dielectric material plate over the metallic heater plate, and a phase change material plate over the spacer dielectric material plate, and
• wherein outer sidewalls of the metallic heater plate are vertically coincident with sidewalls of the spacer dielectric material plate and sidewalls of the phase change material plate.