Imaging apparatus and manufacturing method for imaging apparatus
AssigneeSony Semiconductor Solutions Corporation
InventorsHiroyasu Matsugai, Atsushi Yamamoto
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Abstract
Provided are an imaging apparatus and a manufacturing method for an imaging apparatus that are advantageous for acquiring a captured image in which an influence of α rays is suppressed. An imaging apparatus includes: a sensor substrate having a photoelectric conversion element on which image-capturing light is incident; a cover substrate that covers the photoelectric conversion element and transmits the image-capturing light; and an α-ray transmission preventive film that transmits the image-capturing light.
Claims20
An imaging apparatus, comprising:
- a sensor substrate having a photoelectric conversion element on which image-capturing light is incident;
- a cover substrate that covers the photoelectric conversion element and transmits the image-capturing light;
- and
- an α-ray transmission preventive film that transmits the image-capturing light, wherein the α-ray transmission preventive film has a thickness of 1 μm or less.
An imaging apparatus, comprising:
- a sensor substrate having a photoelectric conversion element on which image-capturing light is incident;
- a cover substrate that covers the photoelectric conversion element and transmits the image-capturing light;
- and
- an α-ray transmission preventive film that transmits the image-capturing light, wherein the α-ray transmission preventive film has a transmittance of an α ray of 0.001 count/h or less.
An imaging apparatus, comprising:
- a sensor substrate having a photoelectric conversion element on which image-capturing light is incident;
- a cover substrate that covers the photoelectric conversion element and transmits the image-capturing light;
- and
- an α-ray transmission preventive film that transmits the image-capturing light,
- wherein the α-ray transmission preventive film is attached to the cover substrate,
- wherein a surface of the cover substrate on the sensor substrate side has an uneven shape, and
- wherein the α-ray transmission preventive film is attached to the surface of the cover substrate on the sensor substrate side.
An imaging apparatus, comprising:
- a sensor substrate having a photoelectric conversion element on which image-capturing light is incident;
- a cover substrate that covers the photoelectric conversion element and transmits the image-capturing light;
- and
- an α-ray transmission preventive film that transmits the image-capturing light, further comprising a gas layer provided between the sensor substrate and the cover substrate.
An imaging apparatus, comprising:
- a sensor substrate;
- a cover substrate;
- and
- a lower lens located between the sensor substrate and the cover substrate and facing the sensor substrate via a gas layer, wherein the gas layer has a thickness of 20 μm or less.
Dependencies are inferred from the claim text.