Thin-film transistor having metal oxide semiconductor layers of heterojunction structure, display device comprising same, and manufacturing method therefor

Abstract

A thin-film transistor comprises a substrate; an insulating layer formed on the substrate; an active layer formed on the insulating layer; and source and drain electrode layers formed on the active layer so as to be spaced from each other, wherein the active layer comprises: a first oxide semiconductor layer consisting of In, Ga and O; and a second oxide semiconductor layer which is formed on the first oxide semiconductor layer and which consists of Zn and O. The thin-film transistor having metal oxide semiconductor layers of a heterojunction structure has greatly improved electron mobility by comprising, as an active layer, oxide semiconductor layers of a heterojunction structure. In addition, the physical properties of a thin-film transistor to be manufactured can be controlled by adjusting the composition and thickness of oxide semiconductor layers through an atomic layer deposition (ALD) process.

Dependencies are inferred from the claim text.