Heated pedestal with low impedance RF rod
AssigneeApplied Materials, Inc.
InventorsSudhir R. Gondhalekar, Peter Lai, Suresh Karavinakoppa, Pavankumar Ramanand Harapanhalli
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Abstract
Embodiments of substrate supports for use in process chambers are provided herein. In some embodiments, a substrate support for a process chamber includes: a pedestal having a support surface for supporting a substrate, one or more heating elements disposed therein, and an RF electrode disposed therein; a hollow shaft coupled to a lower surface of the pedestal; and an RF rod extending through the hollow shaft and having an upper portion that includes an upper end coupled to the RF electrode, wherein the upper end of the RF rod has at least one of (a) a cross sectional width that is wider than a lower portion of the RF rod or (b) one or more slots.
Claims18
A substrate support for a process chamber, comprising:
- a pedestal having a support surface for supporting a substrate, one or more heating elements disposed therein, and an RF electrode disposed therein;
- a hollow shaft coupled to a lower surface of the pedestal;
- and
- an RF rod extending through the hollow shaft and having an upper portion that includes an upper end coupled to the RF electrode, wherein the upper end of the RF rod has one or more slots.
A substrate support for a process chamber, comprising:
- a pedestal having a support surface for supporting a substrate, one or more heating elements disposed therein, and an RF electrode disposed therein;
- a hollow shaft coupled to a lower surface of the pedestal;
- and
- an RF rod extending through the hollow shaft and having an upper end coupled to the RF electrode, wherein an RF transmission path of the RF rod comprising a total length of all edges disposed along the upper end is greater than a total length of a perimeter of the upper end of the RF rod;
- and wherein the upper end of the RF rod has one or more slots, wherein the one or more slots have a width of about 0.01 inches or more.
A process chamber, comprising:
- a chamber body defining an interior volume therein;
- and
- a substrate support disposed in the interior volume and including a pedestal having:
- a support surface for supporting a substrate, one or more heating elements disposed therein, and an RF electrode disposed therein;
- a hollow shaft coupled to a lower surface of the pedestal;
- and
- an RF rod extending through the hollow shaft and having an upper portion that includes an upper end coupled to the RF electrode, wherein the upper end of the RF rod has one or more slots.
Dependencies are inferred from the claim text.