Substrate processing method and substrate processing apparatus using the same
AssigneeASM IP Holding B.V.
InventorsDoohan Kim, YongGyu Han, KiChul Um, DaeYoun Kim
Life of this patent
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Abstract
A substrate processing method capable of performing a stable plasma process includes: supplying a source gas under a first plasma atmosphere using a substrate processing apparatus including a power generation unit, a first reactor, and a matching network between the power generation unit and the first reactor; purging the source gas; supplying a reaction gas under a second plasma atmosphere; and purging the reaction gas, wherein setting a variable capacitor included in the matching network to a first value is performed during the purging of the source gas, and setting the variable capacitor to a second value is performed during the purging of the reaction gas.
Claims13
A substrate processing method using a substrate processing apparatus including a scheduler, a power generation unit, a first reactor, and a matching network located between the power generation unit and the first reactor and comprising a control unit, the substrate processing method comprising:
- supplying a source gas under a first plasma atmosphere;
- purging the source gas;
- supplying a reaction gas under a second plasma atmosphere;
- and
- purging the reaction gas,
- wherein setting a variable capacitor included in the matching network to a first value is performed during the purging of the source gas, and
- setting the variable capacitor to a second value is performed during the purging of the reaction gas,
- wherein the control unit is configured to perform a first adjustment operation on the variable capacitor included in the matching network during at least one of the purging of the source gas and the purging of the reaction gas,
- wherein the control unit is configured to determine, during the first adjustment operation, whether a first condition in which the matching network receives a turn-off signal from the scheduler and a second condition in which turn-off duration of the power generation unit is greater than a time required for capacitance switching of the variable capacitor are satisfied, and
- wherein the control unit performs a second adjustment operation on the variable capacitor after the first adjustment operation when both the first condition and the second condition are satisfied.
Dependencies are inferred from the claim text.