Nanoscale failure analysis method

A nanoscale failure analysis method, comprising:

• step 1:
• providing a first sample to be analyzed, placing the first sample on a sample stage of a focused ion beam (FIB) machine, wherein the FIB machine is a dual-beam system with an ion beam and an electron beam, and performing cutting on a selected area of the first sample by using the ion beam in the FIB machine to form a first cross section and expose a metal pattern on the first cross section;
• step 2:
• depositing a protective layer on the first cross section by using the electron beam of the FIB machine;
• step 3:
• transferring the first sample to a nano prober, the protective layer being used for protecting the metal pattern and preventing metal diffusion in a transfer process, wherein the nano prober is a nano probe system that integrates a scanning electron microscope;
• step 4:
• performing surface micro treatment on the first sample by using another ion source in the nano prober to remove the protective layer and expose the metal pattern;
• and
• step 5:
• performing probing on the metal pattern and implementing electrical testing through the nano prober.