Multimode dose compensation system

An ion implantation system, comprising:

• an ion source configured to generate an ion beam directed at a substrate positioned on a platen;
• a first power supply source configured to generate a powering potential to power the ion source, wherein a first current value is determined based on the powering potential;
• one or more second power supply sources configured to generate one or more second potentials, the one or more second potentials are configured to affect generation of the ion beam by the ion source for application to the substrate, wherein a second current value is determined based on the one or more second potentials;
• an energy filter positioned in a path of the ion beam between the ion source and the substrate;
• at least one processor;
• and
• at least one non-transitory storage media storing instructions, that when executed by the at least one processor, cause the at least one processor to continuously:
• determine one or more energy filter supply current values based on one or more energy filter supply potentials supplied to the energy filter;
• generate, based on the first and second current values and the one or more energy filter supply current values, one or more platen position values;
• and
• cause adjustment of a position of the platen in the path of the ion beam using the one or more platen position values.