# US 12,763,282 B2 · Charged particle assessment system and method > Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt - Number: US 12,763,282 B2 - Document ID: US12763282B2 - Status: Granted - Kind: B2 - Application number: 18/384,791 - Filed: 2023-10-27 - Published: 2024-02-29 - Granted: 2026-10-13 - Earliest claimed: 2021-04-29 - Assignees: ASML Netherlands B.V. - Applicants: ASML Netherlands B.V. - Inventors: Marco Jan-Jaco Wieland - Web page: https://patentgrep.com/patent/US12763282B2 ## CPC - H01J 37/226: {Optical arrangements for illuminating the object; optical arrangements for collecting light from the object} - H01J 37/20: Means for supporting or positioning the object or the material; Means for adjusting diaphragms or lenses associated with the support - H01J 37/244: Detectors; Associated components or circuits therefor - H01J 2237/2482: Optical means - H01J: ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS (spark-gaps H01T; electric arc lamps H05B31/00; particle accelerators H05H) ## Abstract The embodiments of the present disclosure provide a charged particle assessment system comprising: a sample holder configured to hold a sample having a surface; a charged particle-optical device configured to project a charged particle beam towards the sample, the charged particle beam having a field of view corresponding to a portion of the surface of the sample, the charged particle-optical device having a facing surface facing the sample holder; and a projection assembly arranged to direct a light beam along a light path such that the light beam reflects off the facing surface up-beam, with respect to the light path, of being incident on the portion of the surface of the sample. ## Claims ### Claim 1 A charged particle assessment system, comprising: a sample holder configured to hold a sample having a surface; a charged particle-optical device configured to project a charged particle beam towards the sample, the charged particle beam having a field of view corresponding to a portion of the surface of the sample, the charged particle-optical device having a facing surface facing the sample holder; and a projection assembly arranged to direct a light beam along a light path such that the light beam reflects: off the surface of the sample up-beam, with respect to the light path, of reflecting off the facing surface; and at least twice off the facing surface up-beam, with respect to the light path, of being incident on the portion of the surface of the sample. ### Claim 2 (depends on 1) The charged particle assessment system of claim 1, wherein the light beam when incident on the portion of the surface of the sample at least covers the portion of the surface of the sample corresponding to the field of view of the charged particle beam. ### Claim 3 (depends on 1) The charged particle assessment system of claim 1, wherein the projection assembly comprises a light source configured to emit the light beam. ### Claim 4 (depends on 1) The charged particle assessment system of claim 1, wherein the projection assembly comprises an optical system configured to focus the light beam to be narrower in a direction perpendicular to the facing surface than in a direction parallel to the facing surface and perpendicular to an axis of the light beam. ### Claim 5 (depends on 4) The charged particle assessment system of claim 4, wherein: the projection assembly is configured such that an axis angle of the light beam is greater than a focus angle of the light beam; the axis angle is defined between a surface of the sample holder facing the charged particle-optical device and the axis of the light beam immediately up-beam of its entry between the charged particle-optical device and the sample holder; and the focus angle is defined as a taper angle of the light beam caused by the optical system focusing the light beam. ### Claim 6 (depends on 1) The charged particle assessment system of claim 1, wherein the facing surface comprises a surface topography to reflect the light beam towards the sample. ### Claim 7 (depends on 6) The charged particle assessment system of claim 6, wherein the surface topography comprises sawtooth shaped elements angled to reflect the light beam to the portion of the surface of the sample. ### Claim 8 (depends on 6) The charged particle assessment system of claim 6, wherein the projection assembly is positioned relative to the charged particle-optical device and the sample holder so that the projection assembly directs the light beam such that its most down-beam, with respect to the light path, reflection off the facing surface up-beam of being incident on the portion of the surface of the sample is at a topographical region facing the portion. ### Claim 9 (depends on 6) The charged particle assessment system of claim 6, wherein the facing surface comprises a scattering region, the surface topography of the scattering region being configured to scatter the light beam when reflecting the light beam towards the sample. ### Claim 10 (depends on 9) The charged particle assessment system of claim 9, wherein the projection assembly is positioned relative to the charged particle-optical device and the sample holder so that the projection assembly directs the light beam to reflect off the scattering region. ### Claim 11 (depends on 10) The charged particle assessment system of claim 10, wherein the scattering region faces at least the portion of the surface of the sample. ### Claim 12 (depends on 1) The charged particle assessment system of claim 1, comprising a detector configured to detect signal particles emitted by the sample. ### Claim 13 (depends on 12) The charged particle assessment system of claim 12, wherein the surface facing the sample holder is comprised at least in part by the detector. ### Claim 14 (depends on 1) The charged particle assessment system of claim 1, wherein: the light beam comprises coherent light; and the projection assembly comprises a laser light source, wherein the light beam is a laser beam. ### Claim 15 (depends on 1) The charged particle assessment system of claim 1, wherein the facing surface is planar. ### Claim 16 (depends on 1) The charged particle assessment system of claim 1, wherein the facing surface is a surface of the electron-optical device most proximate to the sample holder. ### Claim 17 A method of operating a charged particle assessment system, comprising: holding a sample in a sample holder; projecting a charged particle beam towards the sample using a charged particle-optical device, the charged particle beam having a field of view corresponding to a portion of a surface of the sample, the charged particle-optical device having a facing surface facing the sample; and directing a light beam along a light path using a projection assembly such that the light beam reflects: off the surface of the sample up-beam, with respect to the light path, of reflecting off the facing surface; and at least twice off the facing surface up-beam, with respect to the light path, of being incident on the portion of the surface of the sample. ### Claim 18 (depends on 17) The method of claim 17, wherein the directing comprises controlling the light beam by controlling the projection assembly. ### Claim 19 A charged particle assessment system, comprising: a sample holder configured to hold a sample having a surface; a charged particle-optical device configured to project a charged particle beam towards the sample, the charged particle beam having a field of view corresponding to a portion of the surface of the sample, the charged particle-optical device having a facing surface facing the sample holder; and a projection assembly arranged to direct a light beam along a light path between an optical system and the sample holder to be incident on the portion of the sample surface and such that along the light path, the light beam reflects: off the surface of the sample up-beam, with respect to the light path, of reflecting off the facing surface; and off the facing surface at least twice up-beam, with respect to the light path, of being incident on the portion of the surface of the sample.