System and method for semiconductor topography simulations
AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsNuo Xu, Zhengping Jiang, Ji-Ting Li, Yuan Hao Chang, Zhiqiang Wu, Wen-Hsing Hsieh
Life of this patent
Estimating the term…
Loading patent…
AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsNuo Xu, Zhengping Jiang, Ji-Ting Li, Yuan Hao Chang, Zhiqiang Wu, Wen-Hsing Hsieh
Estimating the term…
The present disclosure provides a method for topography simulation of a physical structure under a topography-changing process. The method includes initializing a voxel mesh as a three-dimensional (3D) representation of a physical structure by a central processing unit (CPU), generating a batch of particles, simulating a flight path of one of the particles with a ray-tracing method by a parallel processing thread in a graphics processing unit (GPU), identifying a surface normal of a voxel unit in the voxel mesh that intersects the flight path by the parallel processing thread in the GPU, passing parameters describing the one of the particles hitting the voxel mesh from the GPU to the CPU, determining a surface reaction between the one of the particles and the voxel unit by the CPU, and updating the voxel mesh based on the determining of the surface reaction.
A method, comprising:
A non-transitory computer-readable storage medium storing instructions that, when executed by a computer, cause the computer to perform a method comprising:
A non-transitory computer-readable storage medium storing instructions that, when executed by a hardware platform, cause the hardware platform to perform a method comprising:
Dependencies are inferred from the claim text.