# US 12,762,679 B2 · Defect characterization in semiconductor devices based on image processing

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- Number: US 12,762,679 B2
- Document ID: US12762679B2
- Status: Granted
- Kind: B2
- Application number: 18/388,623
- Filed: 2023-11-10
- Published: 2024-05-16
- Granted: 2026-10-13
- Earliest claimed: 2022-11-15
- Assignees: Micron Technology, Inc.
- Applicants: Micron Technology, Inc.
- Inventors: Nagasubramaniyan Chandrasekaran
- Web page: https://patentgrep.com/patent/US12762679B2

## CPC

- G06T 7/0004: {Industrial image inspection}
- G06V 10/25: Determination of region of interest [ROI] or a volume of interest [VOI]
- G06V 10/40: Extraction of image or video features
- G06V 10/764: using classification, e.g. of video objects
- G06V 10/7715: {Feature extraction, e.g. by transforming the feature space, e.g. multi-dimensional scaling [MDS]; Mappings, e.g. subspace methods}
- G06V 10/774: Generating sets of training patterns; Bootstrap methods, e.g. bagging or boosting
- G06T 2207/20081: Training; Learning
- G06T 2207/30148: Semiconductor; IC; Wafer
- G06V 20/50: Context or environment of the image
- G06T: IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
- G06V: IMAGE OR VIDEO RECOGNITION OR UNDERSTANDING

## Abstract

A system includes a memory and a processing device, operatively coupled with the memory, to perform operations including: receiving an image of a substrate of an electronic device; extracting, by a feature extraction model processing the image, a plurality of visual features from the image; and identifying, by a trainable feature classifier processing the plurality of visual features, a region of interest corresponding to an electronic circuit associated with performance of the electronic circuit.

## Claims

### Claim 1

A system comprising:
a memory; and
a processing device, operatively coupled with the memory, to perform operations comprising:
receiving an image of a substrate of an electronic device, the image covering an area of the substrate, wherein a critical measurement of the substrate is calculated as an aggregated value over the area;
determining a plurality of candidate regions in the image based on sampling information associated with the critical measurement, wherein the sampling information specifies a plurality of sampling locations within the area, and wherein values measured at the plurality of sampling locations are used to calculate the aggregated value;
extracting, by a feature extraction model processing the image, a plurality of visual features from the image; and
identifying, by a trainable feature classifier processing the plurality of visual features extracted by the feature extraction model, a region of interest among the plurality of candidate regions, the region of interest corresponding to an electronic circuit and associated with performance of the electronic circuit.

### Claim 2 (depends on 1)

The system of claim 1, wherein the operations further comprise:
in view of the region of interest, identifying a defect that leads to a failure of the electronic device.

### Claim 3 (depends on 1)

The system of claim 1, wherein the operations further comprise:
determining, by a trainable defect classification model processing a subset of the plurality of visual features associated with the region of interest, a type of a defect associated with the region of interest.

### Claim 4 (depends on 1)

The system of claim 1, wherein the operations further comprise:
receiving a second image of the region of interest, wherein a resolution of the second image exceeds a resolution of the image of the substrate;
extracting, by a second feature extraction model processing the second image, a second plurality of visual features from the second image; and
identifying, by a second trainable feature classifier processing the second plurality of visual features, a second region of interest corresponding to the electronic circuit associated with performance of the electronic circuit within the second image, wherein the second region of interest is a part of the region of interest.

### Claim 5 (depends on 4)

The system of claim 4, wherein the operations further comprise:
determining, by a trainable defect classification model processing a subset of the second plurality of visual features associated with the second region of interest, a type of a defect associated with the second region of interest.

### Claim 6 (depends on 1)

The system of claim 1, wherein the feature extraction model is trainable.

### Claim 7 (depends on 1)

The system of claim 1, wherein the feature extraction model implements at least one of: Scale Invariant Feature Transform (SIFT), Speeded Up Robust Features (SURF), KAZE, Accelerated-KAZE (AKAZE), Oriented FAST and Rotated BRIEF (ORB), or Binary Robust Invariant Scalable Keypoints (BRISK).

### Claim 8 (depends on 1)

The system of claim 1, wherein the trainable feature classifier implements at least one of: Perceptron, Naive Bayes, Decision Tree, Logistic Regression, K-Nearest Neighbor, Artificial Neural Networks, Deep Learning, or Support Vector Machine.

### Claim 9

A non-transitory computer readable medium comprising instructions, which when executed by a processor, cause the processor to perform operations comprising:
receiving an image of a semiconductor substrate of an electronic device, the image covering an area of the substrate, wherein a critical measurement of the substrate is calculated as an aggregated value over the area;
determining a plurality of candidate regions in the image based on sampling information associated with the critical measurement, wherein the sampling information specifies a plurality of sampling locations within the area, and wherein values measured at the plurality of sampling locations are used to calculate the aggregated value;
extracting, by a feature extraction model processing the image, a plurality of visual features from the image; and
identifying, by a trainable feature classifier processing the plurality of visual features extracted by the feature extraction model, a region of interest among the plurality of candidate regions, the region of interest corresponding to an electronic circuit exhibiting suboptimal performance.

### Claim 10 (depends on 9)

The non-transitory computer readable medium of claim 9, wherein the operations further comprise:
preprocessing the image.

### Claim 11 (depends on 9)

The non-transitory computer readable medium of claim 9, wherein the operations further comprise:
determining, by a trainable defect classification model processing a subset of the plurality of visual features associated with the region of interest, a type of a defect associated with the region of interest.

### Claim 12 (depends on 9)

The non-transitory computer readable medium of claim 9, wherein the operations further comprise:
receiving a second image of the region of interest, wherein a resolution of the second image exceeds a resolution of the image of the semiconductor substrate;
extracting, by a second feature extraction model processing the second image, a second plurality of visual features from the second image; and
identifying, by a second trainable feature classifier processing the second plurality of visual features, a second region of interest corresponding to an electronic circuit exhibiting suboptimal performance within the second image, wherein the second region of interest is a part of the region of interest.

### Claim 13 (depends on 12)

The non-transitory computer readable medium of claim 12, wherein the image is received from a first imaging device, and the second image is received from a second imaging device.

### Claim 14 (depends on 12)

The non-transitory computer readable medium of claim 12, wherein the feature extraction model and the second feature extraction model use different feature detectors.

### Claim 15 (depends on 12)

The non-transitory computer readable medium of claim 12, wherein the trainable feature classifier and the second trainable feature classifier are trained using different training data.

### Claim 16 (depends on 12)

The non-transitory computer readable medium of claim 12, wherein the trainable feature classifier and the second trainable feature classifier are trained using different machine learning techniques.

### Claim 17

A method, comprising:
receiving, by a processing device, an image of a substrate of an electronic device, the image covering an area of the substrate, wherein a critical measurement of the substrate is calculated as an aggregated value over the area;
determining a plurality of candidate regions in the image based on sampling information associated with the critical measurement, wherein the sampling information specifies a plurality of sampling locations within the area, and wherein values measured at the plurality of sampling locations are used to calculate the aggregated value;
extracting, by a feature extraction model processing the image, a plurality of visual features from the image; and
identifying, by a trainable feature classifier processing the plurality of visual features extracted by the feature extraction model, a region of interest among the plurality of candidate regions, the region of interest corresponding to an electronic circuit associated with performance of the electronic circuit.

### Claim 18 (depends on 17)

The method of claim 17, wherein the feature extraction model comprises at least one of: Scale Invariant Feature Transform (SIFT), Speeded Up Robust Features (SURF), KAZE, Accelerated-KAZE (AKAZE), Oriented FAST and Rotated BRIEF (ORB), or Binary Robust Invariant Scalable Keypoints BRISK).

### Claim 19 (depends on 17)

The method of claim 17, wherein the trainable feature classifier comprises at least one of: Perceptron, Naive Bayes, Decision Tree, Logistic Regression, K-Nearest Neighbor, Artificial Neural Networks, Deep Learning, or Support Vector Machine.
