Lithographic performance qualification and associated apparatuses
AssigneeASML Netherlands B.V.
InventorsAlina Nicoleta Tarau, Robert Bastiaan Clark De Korte
Life of this patent
Estimating the term…
Abstract
A method of performing a lithographic performance qualification test. The method includes: obtaining one or more exposure layouts, each relating to exposure of multiple exposure fields on a substrate; performing a dummy exposure on a substrate including photoresist for each of the one or more exposure layouts, the dummy exposure using no exposure illumination or exposure illumination having an exposure energy below an exposure threshold of the photoresist; monitoring one or more exposure parameters of each dummy exposure to obtain exposure parameter data; and evaluating lithographic performance of each dummy exposure and/its corresponding exposure layout from the exposure parameter data respective to that dummy exposure.
Claims20
A method of performing a lithographic performance qualification test, the method comprising:
- obtaining exposure layout data describing multiple exposure layouts, each exposure layout relating to exposure of multiple exposure fields on a substrate;
- performing one or more dummy exposures on a substrate comprising photoresist for each of the one or more exposure layouts, the one or more dummy exposures using no exposure illumination or exposure illumination having an exposure energy below an exposure threshold of the photoresist;
- monitoring one or more exposure parameters of each dummy exposure to obtain exposure parameter data;
- and
- identifying the exposure layout and/or one or more exposure parameters with a best and/or worst performance by evaluating lithographic performance of each dummy exposure and/or its corresponding exposure layout from the exposure parameter data respective to that dummy exposure.
A non-transient computer program carrier comprising a computer program therein, the computer program, when run on a suitable apparatus, configured to cause the apparatus to at least:
- obtain exposure layout data describing multiple exposure layouts, each exposure layout relating to exposure of multiple exposure fields on a substrate;
- obtain exposure parameter data from the performance of one or more dummy exposures on a substrate comprising photoresist for each of the one or more exposure layouts, the one or more dummy exposures using no exposure illumination or exposure illumination having an exposure energy below an exposure threshold of the photoresist;
- and
- identify the exposure layout and/or one or more exposure parameters with a best and/or worst performance by evaluating lithographic performance of each dummy exposure and/or its corresponding exposure layout from the exposure parameter data respective to that dummy exposure.
Dependencies are inferred from the claim text.