Polymers for photoresist and photoresist compositions including the same

A photoresist composition comprising:

• a polymer comprising a first polymerization unit that comprises a sensitizer group;
• and
• a photoacid generator,
• wherein the first polymerization unit comprises a structure of chemical formula 1:
• wherein R1 is hydrogen, a halogen element, a methyl group, a trifluoromethyl group, a substituted or unsubstituted alkyl group having 1 to 10 carbon atoms, a substituted or unsubstituted aryl group having 6 to 18 carbon atoms, or a substituted or unsubstituted arylalkyl group having 6 to 18 carbon atoms, and
• n is an integer of 1 to 100,000;
• and
• wherein the first polymerization unit further comprises at least one of a unit of chemical formula 3 and a unit of chemical formula 4:
• 1 is an integer of 1 to 100,000, and
• k is an integer of 1 to 100,000.

A photoresist composition comprising:

• a polymer comprising a sensitizer group and a protection group;
• a photoacid generator;
• and
• a quencher,
• wherein a first polymerization unit having a structure of chemical formula 1 comprises the sensitizer group, and
• a second polymerization unit having a structure of chemical formula 2 comprises the protection group:
• wherein R1 is hydrogen, a halogen element, a methyl group, a trifluoromethyl group, a substituted or unsubstituted alkyl group having 1 to 10 carbon atoms, a substituted or unsubstituted aryl group having 6 to 18 carbon atoms, or a substituted or unsubstituted arylalkyl group having 6 to 18 carbon atoms, and
• n is an integer of 1 to 100,000,
• wherein R2 is a substituted or unsubstituted alkyl group having 4 to 15 carbon atoms, or an aromatic ring compound,
• m is an integer of 1 to 100,000, and n:m is 3:7 to 5:5;
• and
• wherein the first polymerization unit further comprises at least one of a unit having a structure of chemical formula 3 and a unit having a structure of chemical formula 4:
• wherein 1 is an integer of 1 to 100,000,
• wherein k is an integer of 1 to 100,000.