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US 12,761,553 B2Granted
Resist composition and patterning process
AssigneeShin-Etsu Chemical Co., Ltd.
InventorsMasaki Ohashi, Shun Kikuchi, Seiichiro Tachibana
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Abstract
A resist composition comprising a hypervalent iodine compound having at least two acyloxy groups, a carboxylic acid, and a solvent is provided. When processed by lithography using high-energy radiation, the resist composition exhibits a high sensitivity and resolution.
Claims7
A resist composition comprising a hypervalent iodine compound having at least two acyloxy groups, a carboxylic acid, and a solvent,
- wherein the resist composition does not comprise a photoacid generator.
Dependencies are inferred from the claim text.