Amine compound, chemically amplified resist composition, and patterning process

An amine compound having the formula (1):

• wherein m is an integer of 0 to 10,
• RN1 and RN2 are each independently hydrogen or a C1-C20 hydrocarbyl group in which some or all of the hydrogen atoms may be substituted by halogen and any constituent —CH2— may be replaced by —O— or —C(═O)—, RN1 and RN2 may bond together to form a ring with the nitrogen atom to which they are attached, the ring optionally containing —O— or —S—, with the proviso that RN1 and RN2 are not hydrogen at the same time,
• XL is a C1-C40 hydrocarbylene group which may contain a heteroatom,
• La1 is an ether bond, ester bond, sulfonic ester bond, carbonate bond or carbamate bond,
• the ring RR1 is a C2-C20 (m+2)-valent heterocyclic group having a lactone, lactam, sultone or sultam structure,
• R1 is a C1-C20 hydrocarbyl group which may contain a heteroatom, and when m is 2 or more, a plurality of R1 may be the same or different, a plurality of R1 may bond together to form a ring with the atoms on RR1 to which they are attached, and
• RAL is an acid labile group.