# US 12,761,551 B2 · Method of forming patterns > Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt - Number: US 12,761,551 B2 - Document ID: US12761551B2 - Status: Granted - Kind: B2 - Application number: 18/061,859 - Filed: 2022-12-05 - Published: 2023-09-14 - Granted: 2026-10-13 - Earliest claimed: 2022-01-24 - Assignees: Samsung SDI Co., Ltd.; Samsung Electronics Co., Ltd. - Applicants: Samsung SDI Co., Ltd.; Samsung Electronics Co., Ltd. - Inventors: Hyungrang Moon; Youngkwon Kim; Ryunmin Heo; Minyoung Lee; Minsoo Kim; Kyuwon Lee; Jung Min Choi; Cheol Hong Park; Moohyun Koh; Sang Won Bae; Jungah Kim - Web page: https://patentgrep.com/patent/US12761551B2 ## CPC - G03F 7/0042: {with inorganic or organometallic light-sensitive compounds not otherwise provided for, e.g. inorganic resists (G03F7/075 takes precedence)} - G03F 7/162: {Coating on a rotating support, e.g. using a whirler or a spinner} - G03F 7/168: {Finishing the coated layer, e.g. drying, baking, soaking} - G03F 7/325: {Non-aqueous compositions} - G03F: PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices B41B; photosensitive materials or processes for photographic purposes G03C; electrophotography, sensitive layers or processes therefor G03G) ## Abstract A method of forming patterns includes coating a metal-containing resist composition on a substrate, sequentially coating two types of compositions for removing edge beads along an edge of the substrate, performing a heat-treatment including drying and heating to form a metal-containing resist film on the substrate, and exposing and developing the metal-containing resist film to form a resist pattern; or coating a metal-containing resist composition on a substrate, coating a composition for removing edge beads along an edge of the substrate, performing a heat-treatment including drying and heating to form a metal-containing resist film on the substrate, exposing the metal-containing resist film, and developing with a developing solution composition to form a resist pattern, wherein details of the two types of compositions for removing edge beads and the developing solution composition are as described in the specification. ## Claims ### Claim 1 A method of forming patterns, comprising: coating a metal-containing resist composition on a substrate; sequentially coating two different compositions for removing edge beads along an edge of the substrate; performing a heat-treatment comprising drying and heating to form a metal-containing resist film on the substrate; and exposing and developing the metal-containing resist film to form a resist pattern, wherein the two different compositions for removing edge beads each independently comprise: Composition A comprising a phosphorous acid-based compound and an organic solvent; or Composition B comprising a glycol ether or ester thereof, an ester of hydroxy acid or an ester of alkyl ether acid, and an ester of carboxylic acid, wherein at least one of the two different compositions for removing edge beads comprises Composition A, wherein Composition A does not include ethylenediamine tetramethylene phosphonic acid, and wherein the phosphorous acid-based compound is at least one of phosphonic acid, methyl phosphonic acid, ethyl phosphonic acid, butyl phosphonic acid, hexyl phosphonic acid, n-octyl phosphonic acid, tetradecyl phosphonic acid, octadecyl phosphonic acid, phenyl phosphonic acid, vinyl phosphonic acid, aminomethyl phosphonic acid, methylenediamine tetramethylene phosphonic acid, 1-amino 1-phosphonooctyl phosphonic acid, etidronic acid, 2-aminoethyl phosphonic acid, 3-aminopropyl phosphonic acid, 6-hydroxyhexyl phosphonic acid, decyl phosphonic acid, methylene diphosphonic acid, nitrilotrimethylene triphosphonic acid, 1H, 1H,2H,2H-perfluorooctanephosphonic acid, or a combination thereof. ### Claim 2 (depends on 1) The method of claim 1, wherein: Composition A comprises 0.01 wt % to 50 wt % of the phosphorous acid-based compound, and 50 wt % to 99.99 wt % of the organic solvent based on 100 wt % of Composition A. ### Claim 3 (depends on 1) The method of claim 1, wherein: Composition B comprises 30 wt % to 75 wt % of the glycol ether or ester thereof, 5 wt % to 50 wt % of the ester of hydroxy acid or the ester of alkyl ether acid, and 15 wt % to 55 wt % of the ester of carboxylic acid based on 100 wt % of Composition B. ### Claim 4 (depends on 1) The method of claim 1, wherein: the sequentially coating of the two different compositions for removing edge beads comprises: a first process of coating a composition for removing edge beads of any one of Composition A or Composition B along the edge of the substrate while spinning the substrate, and a second process of coating a composition for removing edge beads that is different from the composition applied in the first process of Composition A and Composition B along the edge of the substrate while spinning the substrate. ### Claim 5 (depends on 4) The method of claim 4, wherein: after the second process, a third process of coating a composition for removing edge beads substrate that is the same composition as the composition applied in the first process of Composition A or Composition B, or is different from Composition A and Composition B along the edge of the substrate while spinning the substrate. ### Claim 6 (depends on 1) The method of claim 1, wherein: after the exposing and the developing, the method further comprises coating at least one of Composition A or Composition B. ### Claim 7 (depends on 1) The method of claim 1, wherein: the glycol ether or ester thereof is one of propylene glycol methyl ether, propylene glycol methyl ether acetate, propylene glycol ethyl ether acetate, or a combination thereof, the ester of hydroxy acid or ester of alkyl ether acid is one of ethyl lactate, ethyl-3-ethoxy propionate, or a combination thereof, and an ester of carboxylic acid is methyl-2-hydroxy isobutyrate. ### Claim 8 (depends on 1) The method of claim 1, wherein: the metal-containing resist composition comprises a metal compound comprising at least one of an alkyl tin oxo group or an alkyl tin carboxyl group. ### Claim 9 A method of forming patterns, comprising: coating a metal-containing resist composition on a substrate; sequentially coating two different compositions for removing edge beads along an edge of the substrate; performing a heat-treatment comprising drying and heating to form a metal-containing resist film on the substrate; and exposing and developing the metal-containing resist film to form a resist pattern, wherein the two different compositions for removing edge beads each independently comprise: Composition A comprising a phosphorous acid-based compound and an organic solvent; or Composition B comprising a glycol ether or ester thereof, an ester of hydroxy acid or an ester of alkyl ether acid, and an ester of carboxylic acid, wherein: the sequentially coating of the two different compositions for removing edge beads comprises: a first process of coating a composition for removing edge beads of any one of Composition A or Composition B along the edge of the substrate while spinning the substrate, and a second process of coating a composition for removing edge beads that is different from the composition applied in the first process of Composition A and Composition B along the edge of the substrate while spinning the substrate, wherein: after the second process, a third process of coating a composition for removing edge beads substrate that is the same composition as the composition applied in the first process of Composition A or Composition B, or is different from Composition A and Composition B along the edge of the substrate while spinning the substrate, and wherein: the composition for removing edge beads that is different from Composition A or Composition B comprises an acid additive and an organic solvent.