Method of production of an electro-optic device comprising integrated conductive edge seal

An electro-optic device having an active display area and comprising

• a first light-transmissive electrode layer having an upper surface, a lower surface, and a peripheral surface, and comprising a first electrode contact location;
• a backplane comprising a second electrode layer, wherein the second electrode layer comprises a second electrode contact location, wherein the backplane has an upper surface, a lower surface, and a peripheral surface;
• an electrophoretic material layer comprising an electrophoretic medium and having an upper surface, a lower surface, and a peripheral surface, wherein the upper surface of the electrophoretic material layer is defined by a perimeter having a length and a width, wherein the upper surface of the electrophoretic material layer is in contact with the lower surface of the first light-transmissive electrode layer, and the lower surface of the electrophoretic material layer is in contact with the upper surface of the backplane;
• and
• a conductive edge seal disposed on the peripheral surfaces of the electrophoretic material layer and the first light-transmissive electrode layer, wherein the conductive edge seal electrically connects the first light-transmissive electrode at the first electrode contact location and the second electrode layer at the second electrode contact location;
• wherein at least part of the first electrode contact location and at least part of the second electrode contact location are outside a volume defined by a vertical extension of the perimeter of the upper surface of the electrophoretic material layer, resulting in the active display area of the device being substantially the same as the area of the upper surface of the electrophoretic material layer;
• wherein the conductive edge seal has a resistivity, the resistivity of the conductive edge seal is less than 10 kOhm·cm for a film thickness of 2 mils, measured using ASTM D257 method.