Pattern measurement device, pattern measurement program, and pattern measurement method

A non-transitory storage medium storing a pattern measurement program for measuring a dimension of a pattern formed on a sample, the pattern measurement program executable by a computer to:

• measure a dimension of the pattern;
• execute statistical outlier processing at least twice on a plurality of dimension values measured by the computer, the statistical outlier processing including processing of a first time that mainly removes an outlier due to a measurement error and processing of a second time that mainly removes an outlier due to a structure of the pattern;
• and
• obtain a representative dimension value of the pattern from one or a plurality of the dimension values from which an outlier has been removed by the computer, wherein
• the pattern is a directed self-assembly (DSA) pattern formed on a semiconductor sample.

A pattern measurement method for measuring a dimension of a pattern formed on a sample, the pattern measurement method comprising:

• measuring a dimension of the pattern;
• executing statistical outlier processing at least twice on a plurality of measured dimension values, the statistical outlier processing including processing of a first time that mainly removes an outlier due to a measurement error and processing of a second time that mainly removes an outlier due to a structure of the pattern;
• and
• obtaining a representative dimension value of the pattern from one or a plurality of the dimension values from which an outlier has been removed, wherein
• the pattern is a directed self-assembly (DSA) pattern formed on a semiconductor sample.