EPI isolation plate with gap and angle adjustment for process tuning

A processing chamber, comprising:

• a body at least partially defining an internal volume;
• a substrate support disposed within the internal volume;
• and
• a flow guide comprising:
• an isolation plate;
• a mechanical actuator;
• and
• an adjustment mechanism coupled to the mechanical actuator, the adjustment mechanism configured to induce an angular movement in the isolation plate, the adjustment mechanism comprising:
• a plurality of lift pin stops, each lift pin stop including an arm coupled to the actuation mechanism;
• and
• a plurality of lift pins disposed on the lift pin stops, wherein the plurality of lift pins are configured to support the isolation plate.

A processing chamber, comprising:

• a body at least partially defining an internal volume;
• a substrate support disposed within the internal volume;
• and
• a flow guide comprising:
• an isolation plate;
• a first parallel block coupled to a lower surface of the isolation plate;
• a second parallel block coupled to a lower surface of the isolation plate, the second parallel block disposed opposite to the first parallel block;
• a mechanical actuator;
• and
• an adjustment mechanism coupled to the mechanical actuator, the adjustment mechanism configured to induce an angular movement in the isolation plate, the adjustment mechanism comprising:
• a plurality of lift pin stops, each lift pin stop including an arm coupled to the actuation mechanism;
• and
• a plurality of lift pins disposed on the lift pin stops, wherein the plurality of lift pins are configured to support the isolation plate.