Showerhead faceplates with angled gas distribution passages for semiconductor processing tools

An apparatus comprising:

• a showerhead faceplate having N sets of gas distribution passages, each gas distribution passage extending from a first side of the showerhead faceplate to a second side of the showerhead faceplate opposite the first side of the showerhead faceplate, wherein:
• the second side of the showerhead faceplate is configured to face towards, and be exposed to, a wafer support located within a semiconductor processing chamber when the showerhead faceplate is installed in the semiconductor processing chamber as part of a showerhead of that semiconductor processing chamber,
• the N sets of gas distribution passages comprise a first set of gas distribution passages comprising a first subset of gas distribution passages and a second subset of gas distribution passages,
• the gas distribution passages in the first subset of gas distribution passages extend at least partially along axes that are each at a first angle relative to the first side,
• the gas distribution passages in the second subset of gas distribution passages extend at least partially along axes that are each at a second angle relative to the first side, the first angle is greater than the second angle,
• the gas distribution passages in the first set of gas distribution passages are arranged such that locations where the gas distribution passages in the first set of gas distribution passages intersect the first side of the showerhead faceplate are grouped in a first set of clusters arranged along a first circular path, and
• each cluster in the first set of clusters is a circular array of locations centered on the first circular path.