Atomic layer deposition methods for making omnidirectional structural color multilayer structures
AssigneesToyota Motor Engineering & Manufacturing North America, Inc., Toyota Jidosha Kabushiki Kaisha
InventorsSongtao Wu, Debasish Banerjee, Minjuan Zhang
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Abstract
A method of forming a multilayer structure that reflects an omnidirectional structural color by atomic layer deposition (ALD) includes introducing at least one reflective core particle into a reaction chamber and depositing a conformal dielectric layer encapsulating the at least one reflective core particle in a dielectric-layer ALD cycle. Subsequently, a conformal barrier layer encapsulating the conformal dielectric layer is deposited in a barrier-layer ALD cycle, and a conformal absorber layer encapsulating the conformal barrier layer is deposited in an absorber-layer ALD cycle.
Claims21
A method of forming a plurality of encapsulated multilayer structures that reflect an omnidirectional structural color by atomic layer deposition (ALD), comprising:
- introducing a plurality of reflective core particles into a reaction chamber;
- depositing a conformal dielectric layer encapsulating each reflective core particle of the plurality of reflective core particles in a dielectric-layer ALD cycle;
- depositing a conformal barrier layer encapsulating the conformal dielectric layer of the each reflective core particle of the plurality of reflective core particles in a barrier-layer ALD cycle;
- and
- depositing a conformal absorber layer encapsulating the conformal barrier layer of the each reflective core particle of the plurality of reflective core particles in an absorber-layer ALD cycle, wherein
- each encapsulated multilayer structure of the plurality of the encapsulated multilayer structures has a D50 diameter greater than or equal to 1 μm and less than or equal to 500 μm.
Dependencies are inferred from the claim text.