# US 12,760,409 B2 · Method and device for changing test substrates in a continuous-flow vacuum system, treatment method, and continuous-flow vacuum system > Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt - Number: US 12,760,409 B2 - Document ID: US12760409B2 - Status: Granted - Kind: B2 - Application number: 18/258,022 - Filed: 2021-12-16 - Published: 2024-03-28 - Granted: 2026-10-13 - Earliest claimed: 2020-12-17 - Assignees: Solayer GmbH - Applicants: Solayer GmbH - Inventors: Jens Hergenröther; Andreas Rack; Florian Schwarz; Peter Rettenbacher; Thomas Merz - Web page: https://patentgrep.com/patent/US12760409B2 ## CPC - C23C 14/568: {Transferring the substrates through a series of coating stations (C23C14/562 takes precedence)} - C23C 14/24: Vacuum evaporation - C23C 14/505: {for rotation of the substrates} - C23C: COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL (making metal-coated products by extrusion B21C23/22; covering with metal by connecting pre-existing layers to articles, see the relevant places, e.g. B21D39/00, B23K; metallising of glass C03C; metallising mortars, concrete, artificial stone, ceramics or natural stone C04B41/00; enamelling of, or applying a vitreous layer to, metals C23D; treating metal surfaces or coating of metals by electrolysis or electrophoresis C25D; single-crystal film growth C30B; by metallising textiles D06M11/83; decorating textiles by locally metallising D06Q1/04) ## Abstract A method for changing test substrates in a continuous-flow vacuum system in a multiple-treatment-step process cycle for treating a substrate, a treatment method using the method for changing test substrates, and systems for treating a plurality of substrates (61) and for changing test substrates. For at least two treatment steps, at least two test substrates (66) are transferred to a vacuum treatment system at the beginning of the process cycle and are transferred back out once the process cycle is concluded. Subsequently, the first test substrate (66) concurrently treated in this step is removed from the measurement position (70) it occupied during the treatment and is deposited in an empty position (71) without a test substrate (66). Subsequently, the second test substrate (66) which has not been treated yet is deposited in the resulting free measurement position (70) for the purpose of supplying the second test substrate to the subsequent treatment step. ## Claims ### Claim 1 A method for changing test substrates, the method comprising a plurality of successive treatment steps in a continuous-flow vacuum system which has a plurality of treatment stations and a transport device comprising at least one carrier for holding both to-be-treated substrates and test substrates, and for transporting the to-be-treated substrates and the test substrates through the plurality of treatment stations, wherein: at least two untreated test substrates are fed into the continuous-flow vacuum treatment system at a beginning of a process run and discharged after completion of the process run; for each of at least two of the successive treatment steps, an untreated test substrate is treated together with the to-be-treated substrates; after a first treatment step of the successive treatment steps, a first test substrate treated in the process run is removed from a measuring position on the at least one carrier occupied by the first test substrate during the first treatment step and is the deposited in an empty position on the at least one carrier having no test substrate; and after removal of the first test substrate treated in the process run, a second, still untreated test substrate is removed from a holding position on the carrier and is deposited in the measuring position, from which the first test substrate was removed, for the purpose of being fed to a subsequent treatment step of the successive treatment steps. ### Claim 2 (depends on 1) The method of claim 1, wherein the previously treated first test substrate is removed from the empty position and deposited in the previously vacated holding position or another holding position on the carrier that does not have a test substrate. ### Claim 3 (depends on 2) The method of claim 2, wherein more than two test substrates are supplied and the changing of the test substrates between measuring positions, empty positions, and holding positions is repeated after each treatment step until all test substrates are treated. ### Claim 4 (depends on 1) The method of claim 1, wherein the changing of the test substrates between measuring positions, empty positions, and holding positions is performed by a loading station of the continuous-flow vacuum system and the test substrates are moved between the positions by the transport device relative to the loading station for access to the test substrates. ### Claim 5 (depends on 4) The method of claim 4, wherein the loading station accesses the test substrates or holders of the test substrates using mechanical, electrical, pneumatic, or magnetic holding. ### Claim 6 (depends on 1) The method of claim 1, wherein the transport device comprises a plurality of carriers and the test substrates are changed between measuring positions and/or empty positions and/or holding positions either on the same carrier or on different carriers. ### Claim 7 (depends on 1) The method of claim 1, wherein a treatment result on the first test substrate treated in the process run is analyzed. ### Claim 8 (depends on 7) The method of claim 7, wherein for each treatment step of the process run to be monitored, a test substrate is introduced together with the to-be-treated substrates and is treated and analyzed in the measuring position, wherein the untreated test substrates are held in holding positions and are protected from treatment. ### Claim 9 (depends on 7) The method of claim 7, wherein the to-be-treated substrates and the test substrates are transported on a circular path through the treatment stations and are repeatedly exposed to treatment during a treatment step in the relevant treatment station, wherein for changing positions of the test substrates, the transport device is stopped in those positions in which a test substrate is required for the treatment, and wherein for changing positions of the test substrates, the transport device is stopped in those positions in which a loading station of the treatment device used for the test substrate change can access the test substrate position currently to be used.