Cleaning agent composition for substrate for semiconductor devices and method for cleaning substrate for semiconductor devices using the same

A cleaning agent composition for a substrate for a semiconductor device, comprising a compound represented by the following Formula 1 and an organic solvent, wherein the organic solvent is an aprotic organic solvent with a dielectric constant of 9 or less,

• wherein the organic solvent is an acetate-based solvent represented by the following Formula 2 or a C5-C10 aliphatic alkane-based solvent:
• wherein R1 to R4 are independently selected from the group consisting of hydrogen, a halogen group, a hydroxy group, a C1-C8 alkyl group, a C1-C8 alkyl group substituted with a halogen group, a C1-C8 alkyl group substituted with a hydroxy group, cycloalkyl, and heterocycloalkyl;
• R5 and R6 are independently selected from the group consisting of hydrogen, a halogen group, a hydroxy group, —NO2, —NR′R″, —N2, a C1-C8 alkyl group, a C1-C8 alkyl group substituted with a halogen group, and a C1-C8 alkyl group substituted with a hydroxy group;
• and
• R′ and R″ are independently selected from the group consisting of hydrogen and a C1-C4 alkyl group, or R′ and R″ may be connected to each other to form a 5- to 7-membered ring,
• wherein X is a straight or branched chain C1-C6 alkyl group, and —CH2— of the alkyl may be substituted with an oxygen atom.