Composition for forming resist underlayer film
AssigneeNissan Chemical Corporation
InventorsYuto Hashimoto, Shun Kubodera, Shigetaka Otagiri, Satoshi Kamibayashi, Tokio Nishita, Yuichi Goto, Yasunobu Someya, Yuki Endo
Life of this patent
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Abstract
Provided is a composition which is for forming a resist underlayer film and with which the amount of a sublimate derived from a low-molecular-weight component such as an oligomer can be reduced, the composition comprising, for example, an organic solvent and a polymer having a repeating unit represented by formula (1-1), wherein the content of a low-molecular-weight component having a weight average molecular weight of 1,000 or less is 10 mass % or less in the polymer.
Claims11
A composition for forming resist underlayer film comprising:
- a polymer having a repeating unit having the following formula (1-1) or (1-3);
- and
- an organic solvent,
- wherein a content of a low molecular weight component having a weight average molecular weight of 1,000 or less derived from the polymer is 10 wt % or less,
- wherein the polymer is obtained by a method comprising a first step of reacting any of monomers having the following formula (a) with a monomer selected from the monomers of formulae (b) in the presence of a quaternary phosphonium salt or a quaternary ammonium salt in an organic solvent to synthesize a crude polymer having a repeating unit having the following formula (1-1) or (1-3), and then, adding cation exchange resin and anion exchange resin to the obtained crude polymer solution to perform ion exchange treatment;
- and
- a second step of mixing a solution containing the crude polymer obtained in the first step with a poor solvent, then precipitate a purified polymer having the repeating unit having the formula (1-1) or (1-3), and filtering the polymer;
- wherein 54.6 wt % or more of a low molecular weight component having a weight average molecular weight of 1,000 or less is removed from the crude polymer by the second step:
A polymer having a repeating unit having the following formula (1-1) or (1-3),
- wherein a content of a low molecular weight component having a weight average molecular weight of 1,000 or less derived from the polymer is 10 wt % or less,
- wherein the polymer is obtained by a method comprising a first step of reacting any of monomers having the following formula (a) with a monomer selected from the monomers of formulae (b) in the presence of a quaternary phosphonium salt or a quaternary ammonium salt in an organic solvent to synthesize a crude polymer having a repeating unit having the following formula (1-1) or (1-3), and then, adding cation exchange resin and anion exchange resin to the obtained crude polymer solution to perform ion exchange treatment;
- and
- a second step of mixing a solution containing the crude polymer obtained in the first step with a poor solvent, then precipitate a purified polymer having the repeating unit having the formula (1-1) or (1-3), and filtering the polymer;
- wherein 54.6 wt % or more of a low molecular weight component having a weight average molecular weight of 1,000 or less is removed from the crude polymer by the second step:
Dependencies are inferred from the claim text.