# US 12,759,332 B2 · Etching plate, method of fabricating window using the same, and window fabricated using the same

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- Number: US 12,759,332 B2
- Document ID: US12759332B2
- Status: Granted
- Kind: B2
- Application number: 18/507,207
- Filed: 2023-11-13
- Published: 2024-10-03
- Granted: 2026-10-13
- Earliest claimed: 2023-03-31
- Assignees: Samsung Display Co., Ltd.
- Applicants: Samsung Display Co., LTD.
- Inventors: Jun Young Kim; Dong Ho Kim; Ju Suk Oh
- Web page: https://patentgrep.com/patent/US12759332B2

## CPC

- B41M 1/10: Intaglio printing {; Gravure printing}
- B41M: PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING, (correction of typographical errors B41J; processes for applying transfer pictures or the like B44C1/16; fluid media for correction of typographical errors by coating C09D10/00; printing textiles D06P)

## Abstract

An etching plate includes a first intaglio pattern portion spaced apart from an edge portion of the etching plate and having a first depth, and a second intaglio pattern portion adjacent to the first intaglio pattern portion, and having a second depth greater than the first depth of the first intaglio pattern portion.

## Claims

### Claim 1

An etching plate comprising:
a first intaglio pattern portion spaced apart from an edge portion of the etching plate, the first intaglio pattern portion having a first depth; and
a second intaglio pattern portion adjacent to the first intaglio pattern portion, the second intaglio pattern portion having a second depth greater than the first depth of the first intaglio pattern portion,
wherein the second intaglio pattern portion is at an outer periphery of an entirety of the first intaglio pattern portion,
wherein the first intaglio pattern portion and the second intaglio pattern portion contact each other, and
wherein the first intaglio pattern portion and the second intaglio pattern portion are configured to form a bezel area of a window.

### Claim 2 (depends on 1)

The etching plate according to claim 1, wherein
a width of the first intaglio pattern portion is substantially equal to a width of an inner bezel area of the bezel area of the window, and
a width of the second intaglio pattern portion is substantially equal to a width of an outer bezel area of the bezel area of the window.

### Claim 3

An etching plate comprising:
a first intaglio pattern portion spaced apart from an edge portion of the etching plate, the first intaglio pattern portion having a first depth;
a second intaglio pattern portion adjacent to the first intaglio pattern portion, the second intaglio pattern portion having a second depth greater than the first depth of the first intaglio pattern portion; and
a third intaglio pattern portion formed between the first intaglio pattern portion and the second intaglio pattern portion, a lower surface of the third intaglio pattern portion is continuously inclined at an angle,
wherein the first, second, and third intaglio pattern portions are configured to form a bezel area of a window.

### Claim 4 (depends on 3)

The etching plate according to claim 3, wherein
a sum of a width of the first intaglio pattern portion and a width of the third intaglio pattern portion is substantially equal to a width of an inner bezel area of the bezel area of the window, and
a width of the second intaglio pattern portion is substantially equal to a width of an outer bezel area of the bezel area of the window.

### Claim 5 (depends on 1)

The etching plate according to claim 1, wherein
the first depth is in a range of about 10 μm to about 20 μm, and
the second depth is in a range of about 20 μm to about 30 μm.

### Claim 6 (depends on 3)

The etching plate according to claim 3, wherein the angle is less than 90°.