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US 12,758,988 B2Granted
Showerhead heated by circular array
AssigneeApplied Materials, Inc.
InventorsShashidhara Patel H B, Muhannad Mustafa, Amit Sahu, Sanjeev Baluja
Life of this patent
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Abstract
Process chamber lids, processing chambers and methods using the lids are described. In some embodiments, the lid includes a showerhead with a plurality of heater segments in a peripheral region thereof. The heated showerhead minimizes temperature non-uniformity and/or minimizes heat less near the peripheral edge of a processed wafer.
Claims15
A process chamber lid comprising:
- a lid plate comprising a body having an inner wall, an outer wall, a top wall and a bottom wall, the inner wall extending around a central axis spaced a first distance from the central axis forming an open central region,
- a showerhead positioned within the open central region, the showerhead having a front surface and a back surface defining a thickness with a plurality of apertures extending through the thickness;
- a gas funnel positioned above the showerhead, the gas funnel having a front surface, a back surface, an outer wall and an inner wall, the gas funnel having an opening extending through the back surface to the front surface;
- and
- a showerhead heater positioned on the back surface of the showerhead and configured to directly heat the showerhead.
2 more elements
Dependencies are inferred from the claim text.