Integrated circuit (IC) device with hybrid metal layer
AssigneeIntel Corporation
InventorsJune Choi, Charles Henry Wallace, Richard E. Schenker, Nikhil Jasvant Mehta
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AssigneeIntel Corporation
InventorsJune Choi, Charles Henry Wallace, Richard E. Schenker, Nikhil Jasvant Mehta
Estimating the term…
An IC device includes a transistor, a first layer, and a second layer. The first layer is coupled to the transistors and is between the transistor and the second layer in a first direction. The first layer includes a first structure and a second structure. The first structure includes a first metal (e.g., Ru). The second structure includes a second metal (e.g., Cu). The second structure may be wrapped around by a different material that may include a third metal (e.g., Co). The first structure may be shorter than the second structure in the first direction and narrower than the second structure in a second direction orthogonal to the first direction. The first structure may be closer to the second layer than the second structure in the first direction. The first structure may be a wordline of a memory. The second structure may be a bitline.
An integrated circuit (IC) device, comprising:
An integrated circuit (IC) device, comprising:
An integrated circuit (IC) device, comprising:
Dependencies are inferred from the claim text.