Substrate processing apparatus and substrate processing method

A substrate processing apparatus, comprising:

• an inspection substrate including a base and an imaging unit disposed at the base;
• a holder configured to hold a substrate or the inspection substrate;
• a driving unit configured to rotate the holder;
• a processing liquid supply having a nozzle configured to discharge a processing liquid to the substrate held by the holder;
• and
• a controller,
• wherein the controller is configured to perform:
• adjusting a position of the imaging unit with respect to the nozzle to a predetermined first imaging position by controlling the driving unit to rotate the holder in a state that the inspection substrate is held by the holder;
• imaging, after the adjusting of the position of the imaging unit to the first imaging position, the nozzle at the first imaging position by controlling the imaging unit,
• adjusting, after the imaging of the nozzle at the first imaging position, the position of the imaging unit with respect to the nozzle to a second imaging position different from the first imaging position by controlling the driving unit to rotate the holder in a state in which the inspection substrate is held by the holder;
• and
• imaging, after the adjusting of the position of the imaging unit to the second imaging position, the nozzle at the second imaging position by controlling the imaging unit.