Substrate treating apparatus and substrate treating method
AssigneeSemes Co., Ltd.
InventorsYoung Hun Lee, Do Hyeon Yoon, Eun Seok Kim
Life of this patent
Estimating the term…
Abstract
Disclosed is a substrate treating apparatus including: a treating chamber for treating a substrate; a transfer unit for loading and unloading the substrate into and from a treatment space in which the substrate is treated in the treating chamber; and a heating unit provided to be loaded into and unloaded from the treatment space, and for cleaning the treatment space by heating, in which the treating chamber includes: a chamber body providing the treatment space; and a support unit for supporting the substrate within the treatment space; and a fluid supply unit for supplying a fluid, which treats the substrate, into the treatment space, and the heating unit includes: a base; and a heater installed on the base.
Claims12
A substrate treating apparatus, comprising:
- a treating chamber configured to treat a substrate;
- a transfer unit configured to load and unload the substrate into and from a treatment space;
- and
- a heating unit configured to be loaded into and unloaded from the treatment space, the heating unit being configured to heat and clean the treatment space by heating,
- wherein the treating chamber includes:
- a chamber body defining the treatment space;
- and
- a support configured to support the substrate within the treatment space;
- and
- a fluid supply configured to supply a fluid, which treats the substrate, in the treatment space, and
- the heating unit includes:
- a base;
- and
- at least one first heater on a surface of the base, the support being configured to support the base;
- and
- a controller configured to control the transfer unit and the heating unit,
- the controller being configured to control the transfer unit and the heating unit to cause the heating unit to clean the treatment space in the state where the heating unit is supported on the support unit.
A substrate treating apparatus, comprising:
- a treating chamber configured to treat a substrate;
- a transfer unit configured to load and unload the substrate into and from a treatment space;
- and
- a heating unit configured to be loaded into and unloaded from the treatment space, the heating unit being configured to heat and clean the treatment space by heating,
- wherein the treating chamber includes:
- a chamber body defining the treatment space;
- and
- a support configured to support the substrate within the treatment space;
- and
- a fluid supply configured to supply a fluid, which treats the substrate, in the treatment space, and
- the heating unit includes:
- a base;
- and
- at least one first heater on a surface of the base,
- the heating unit being configured to be movable by the transfer unit,
- a controller configured to control the transfer unit and the heating unit,
- the controller being configured to control the transfer unit and the heating unit to clean the treatment space when the heating unit is in the transfer unit, and
- the controller being configured to control the transfer unit to change a position of the heating unit within the treatment space while the treatment space is being cleaned.
A substrate treating apparatus, comprising:
- a treating chamber configured to remove organic solvents remaining on a substrate following exposure a supercritical fluid;
- a transfer unit configured to load and unload the substrate into and from a treatment space, the treatment space being configured to treat the substrate;
- and
- a heating unit configured to be loaded into and unloaded from the treatment space, the heating unit being configured to heat and clean the treatment space by heating,
- wherein the treating chamber includes:
- a chamber body defining the treatment space;
- a support configured to support the substrate within the treatment space;
- and
- a fluid supply configured to supply the supercritical fluid to the treatment space, and
- the chamber body including
- an upper body and a lower body which are combined to define the treatment space;
- a driver configured to move for the upper body or the lower body such that a relative position between the upper body and the lower body is changed, and
- the heating unit including
- a base;
- and
- at least one first heater on a surface of the base;
- and
- a controller configured to control the transfer unit and the heating unit,
- the controller being configured to cause the heating unit to clean the treatment space in the state when the heating unit is supported on the support.
Dependencies are inferred from the claim text.