Preparation method of electrode grid lines, and photovoltaic (PV) cell

A preparation method of electrode grid lines, comprising the following steps:

• S1:
• providing a substrate, and forming a polymer layer on the substrate;
• S2:
• providing a mold corresponding to a desired electrode pattern, and imprinting a trench corresponding to the desired electrode pattern on the polymer layer through the mold;
• S3:
• coating a conductive material on the polymer layer, wherein the conductive material fully fills the trench, and scraping off any excess conductive material;
• S4:
• drying the conductive material;
• S5:
• upon drying, dissolving the polymer layer;
• and S6:
• sintering the conductive material to form the electrode grid lines,
• wherein in the step S2, an imprinting residual layer has a thickness of 0.5-2 μm, and
• wherein the preparation method further comprises a step S2-1 between the step S2 and the step S3:
• removing a part of the polymer layer, wherein a bottom of the trench and a top of the substrate are on a same horizontal plane.