Back to results
US 12,757,375 B2Granted
Assembly structure including a plurality of spacers and method of manufacturing the same
AssigneeNanya Technology Corporation
InventorPin-Yuan Su
Life of this patent
Estimating the term…
Abstract
An assembly structure including a plurality of spacers, and a method of manufacturing the same are provided. The assembly structure includes a base material and a plurality of spacers disposed over the base material. Each of the plurality of spacers has a first lateral surface and a second lateral surface opposite to the first lateral surface. The second lateral surface is substantially parallel with the first lateral surface. A ratio of a height of the second lateral surface to a height of the first lateral surface is greater than 90%.
Claims15
A method of manufacturing a plurality of spacers, comprising:
- providing a base material;
- forming a plurality of units over the base material, wherein each of the plurality of units includes an under layer (UL) and a hard mask (HM) on the under layer (UL);
- forming a cover layer to cover the units, wherein the cover layer includes a plurality of first portions disposed on top surfaces of the plurality of units, a plurality of second portions disposed on lateral surfaces of the plurality of units, and a plurality of third portions connecting the plurality of second portions;
- forming an upper material to cover the cover layer;
- removing the upper material and the plurality of first portions of the cover layer;
- removing the hard mask (HM) and the plurality of third portions of the cover layer;
- and
- removing the under layer (UL) to form a plurality of spacers, wherein each of the plurality of spacers has a first lateral surface and a second lateral surface opposite to the first lateral surface, the second lateral surface is substantially parallel with the first lateral surface, and a ratio of a height of the second lateral surface to a height of the first lateral surface is greater than 90%;
- wherein a sacrificial layer is disposed between the plurality of units and the base material, wherein after removing the under layer (UL) to form the plurality of spacers, the method further includes:
- removing a plurality of portions of the sacrificial layer that are not covered by the plurality of spacers;
- wherein removing the hard mask (HM) and the plurality of third portions includes:
- removing the hard mask (HM) and the plurality of third portions of the cover layer by using an etching gas;
- and
- removing an upper portion of the under layer (UL) and an upper portion of each of the plurality of second portions of the cover layer to form a remaining portion of the under layer (UL) and the plurality of spacers, wherein the etching gas and the upper portion of the under layer (UL) react to form a polymer to protect the plurality of spacers.
11 more elements
A method of manufacturing a plurality of openings in a base material, comprising:
- providing a base material;
- forming a plurality of spacers over the base material, wherein each of the plurality of pacers has a first lateral surface and a second lateral surface opposite to the first lateral surface, the second lateral surface is substantially parallel with the first lateral surface, and a ratio of a height of the second lateral surface to a height of the first lateral surface is greater than 90%;
- and
- forming a plurality of openings in the base material by using the plurality of spacers as a plurality of mask structures;
- wherein forming the plurality of spacers includes:
- forming a plurality of units over the base material, wherein each of the plurality of units includes an under layer (UL) and a hard mask (HM) on the under layer (UL);
- forming a cover layer to cover the units, wherein the cover layer includes a plurality of first portions disposed on top surfaces of the plurality of units, a plurality of second portions disposed on lateral surfaces of the plurality of units, and a plurality of third portions connecting the plurality of second portions;
- forming an upper material to cover the cover layer;
- removing the upper material and the plurality of first portions of the cover layer;
- removing the hard mask (HM) and the plurality of third portions of the cover layer;
- and
- removing the under layer (UL) to form the plurality of spacers;
- wherein removing the hard mask (HM) and the plurality of third portions includes:
- removing the hard mask (HM) and the plurality of third portions of the cover layer by using an etching gas;
- and
- removing an upper portion of the under layer (UL) and an upper portion of each of the plurality of second portions of the cover layer to form a remaining portion of the under layer (UL) and the plurality of spacers, wherein the etching gas and the upper portion of the under layer (UL) react to form a polymer to protect the plurality of spacers.
13 more elements
Dependencies are inferred from the claim text.